| Aha Nlereanya | YY2308B | |
| Ọkọlọtọ | ISO13320-1: 2009, GB/T19007-2016, Q/0100JWN001-2013Nrube isi na 21 CFR Nkebi 11 | |
| Ụkpụrụ | Ụkpụrụ nke diffraction laser | |
| Nyocha | Mie na Fraunhofer gbasasịa | |
| Nhazi Nchọpụta | Usoro nwere oghere,ule n'akuku si0.015ogo na 14ogo 5 | |
| Oke nso | Mmiri: 0.01μm-1200 μm Akọrọ: 0.1μm-1200μm | |
| Ndị na-ese foto silicon | Mmiri:127pcsAkọrọ:100pcs | |
| Njehie ziri ezi | Mmiri1% kpọrọ nkụ <1% (CRM D50) | |
| Njehie mmeghari ugboro ugboro | Mmiri1% kpọrọ nkụ <1% (CRM D50) | |
| Isi iyi ọkụ | Igwe ọkụ na-acha uhie uhie nke semiconductor dị elu (λ=639nm) P>3.0MWA inyeakaakwụkwọ ndụ akwụkwọ ndụ siri ikesemiconductor laser (λ=405nm) P>2.0MW(dị) | |
| Ụzọ anya | Converging ọkụ Fourier na-agbanwe ụzọ ngwa anya | |
| Ogologo focal dị irè | 500mm | |
| Nchekwa Laser | Klas 1 | |
| Mgbasa mmiri | Ultrasonic | Ugboro: 40KHz Ike:60W, Oge: ≥1S |
| Gbanwee | Ọsọ mgbanwe mgbanwe: 0-3000RPM (nwere ike idozi) | |
| Kesaa | Egoruru erugharị:30Enyere ike L/min:70W | |
| Ọkwa mmiriihe mmetụta(UK | Gbochie oke mmiri ma chebe ngwa ahụ nke ọma | |
| Ihe atụtankị | Olu:1000ml | |
| Micro-Samplecuvette | Olu: 10ml (dị) | |
| Mgbasa akọrọ | Teknụzụ patent dispersion akọrọ-mgbagwoju anya, usoro ịma jijiji na-efegharị efegharị nkịtị | |
| Ọsọ inye nri | Enwere ike idozi (Knob ọsọ ọsọ na-agbanwe agbanwe) | |
| Ụdị ọrụ | Njikwa akpaaka zuru oke / ntuziaka, họrọ n'efu | |
| Ọkara mgbasa | Ikuku emetụtara, nrụgide: 0 ruo 6 mmanya | |
| Sistemụ nhazi bench anya | Akpaaka zuru oke, nkenke ruru 0.2um | |
| JuputaraNwalee ọsọ kwa oge | Mmiri:.2 min kpọrọ nkụ:<1 nkejiOge ntụgharị n'otu nsonaazụ ule: 500ms | |
| Akụkụ elu | L104cm × W44cm × H54cm | |
| Nha ịbụ | 70kg | |